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Special graphite is a kind of artificial graphite that is processed. It is an important material that is indispensable in all aspects of semiconductor and photovoltaic manufacturing process, including crystal growth, ion implantation, epitaxy, etc.


1. Silicon Carbide (SiC) Crystal Growth

Silicon carbide, as a third-generation semiconductor material, is widely used in new energy vehicles, 5G communications, and other fields. In the 6-inch and 8-inch SiC crystal growth process, isostatic graphite is primarily used to manufacture the following key components:

Graphite crucible: This can be used to synthesize SiC powder feedstock and also assist in crystal growth at high temperatures. Its high purity, high-temperature resistance, and thermal shock resistance ensure a stable crystal growth environment.

Graphite heater: This provides uniform heat distribution, ensuring high-quality SiC crystal growth.

Insulation tube: This maintains temperature uniformity within the crystal growth furnace and reduces heat loss.


2. Ion Implantation

Ion implantation is a key process in semiconductor manufacturing. Isostatic graphite is primarily used to manufacture the following components in ion implanters:

Graphite getter: This absorbs impurity ions in the ion beam, ensuring ion purity.

Graphite focusing ring: This focuses the ion beam, improving ion implant accuracy and efficiency. Graphite substrate trays: Used to support silicon wafers and maintain stability and consistency during ion implantation.


3. Epitaxy Process

The epitaxy process is a critical step in semiconductor device manufacturing. Isostatically pressed graphite is primarily used to manufacture the following components in epitaxy furnaces:

Graphite trays and susceptors: Used to support silicon wafers, providing stable support and uniform heat conduction during the epitaxy process.


4. Other Semiconductor Manufacturing Applications

Isostatically pressed graphite is also widely used in the following semiconductor manufacturing applications:

Etching Process: Used to manufacture graphite electrodes and protective components for etchers. Its corrosion resistance and high purity ensure stability and precision in the etching process.

Chemical Vapor Deposition (CVD): Used to manufacture graphite trays and heaters within CVD furnaces. Its high thermal conductivity and high-temperature resistance ensure uniform thin film deposition.

Packaging Testing: Used to manufacture test fixtures and carrier trays. Its high precision and low contamination ensure accurate test results.


Advantages of graphite parts


High purity:

Using high-purity isostatically pressed graphite material with extremely low impurity content, it meets the stringent material purity requirements of semiconductor manufacturing. The company's own purification furnace can purify graphite to below 5ppm.


High precision:

With advanced processing equipment and mature processing technology, it ensures that the product's dimensional accuracy and form and position tolerances reach the micron level.


High performance:

The product has excellent high temperature resistance, corrosion resistance, radiation resistance, high thermal conductivity and other properties, meeting the various harsh working conditions of semiconductor manufacturing.


Customized service:

Customized product design and processing services can be provided according to customer needs to meet the needs of different application scenarios.


Types of graphite products

(1) Isostatic graphite
Isostatic graphite products are produced by cold isostatic pressing. Compared with other forming methods, the crucibles produced by this process have excellent stability. The graphite products required for SiC single crystals are all large in size, which will lead to uneven purity on the surface and inside of the graphite products, which cannot meet the use requirements. In order to meet the deep purification requirements of large-sized graphite products required for SiC single crystals, a unique high-temperature thermochemical pulse purification process should be adopted to achieve deep and uniform purification of large-sized or special-shaped graphite products, so that the purity of the product surface and core can meet the use requirements.


(2) Porous graphite
Porous graphite is a type of graphite with high porosity and low density. In the SiC crystal growth process, porous graphite plays a significant role in improving mass transfer uniformity, reducing the occurrence rate of phase change and improving the crystal shape.
The use of porous graphite improves the temperature and temperature uniformity of the raw material area, increases the axial temperature difference in the crucible, and also has a certain effect on weakening the recrystallization of the raw material surface; in the growth chamber, porous graphite improves the stability of material flow throughout the growth process, increases the C/Si ratio of the growth area, helps to reduce the probability of phase change, and at the same time, porous graphite also plays a role in improving the crystal interface.


(3) Felt
Soft felt and hard felt both play the role of important thermal insulation materials in SiC crystal growth and epitaxial links.


(4) Graphite foil
Graphite paper is a functional material made from high-carbon flake graphite through chemical treatment and high-temperature rolling. It has high thermal conductivity, electrical conductivity, flexibility, and corrosion resistance.


(5) Composite materials
Carbon-carbon thermal field is one of the core consumables in photovoltaic single crystal furnace production.


Semicorex Production

Semicorex make graphite with small-batch, customized production methods. The small-batch production makes the products more controllable. The entire process is controlled by Programmable Logic Controllers (PLCs), the detailed process data were recorded, enabling complete lifecycle traceability.

During the entire roasting process, the consistency achieved in resistivity across different locations, and the tight temperature control maintained. This ensures the homogeneity and reliability of the graphite materials.

Semicorex utilize fully isostatic pressing technology, which is different from other suppliers; it means the graphite is ultra uniform itself and is proven particularly important in epitaxial processes. The comprehensive material uniformity tests were conducted, including density, resistivity, hardness, bending strength, and strength across different samples.




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黒鉛粉末

黒鉛粉末

Semicorex グラファイトパウダー (純度 99.999%、粒径 1 ~ 5 µm) は、半導体結晶成長に不可欠な高性能材料であり、優れた純度および安定性を備えています。 Semicorex は最高の品質基準を保証し、高度な製造向けにカスタマイズされたソリューションを提供します。*

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フロン棒

フロン棒

Semicorex CFC ロッドは、高温真空炉や特殊雰囲気オーブンのシャフトなど、耐荷重用途で使用するために特別に設計されています。

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グラファイトソフトフェルト

グラファイトソフトフェルト

セミコレックス グラファイト ソフト フェルトは、半導体結晶成長プロセスにおいて最適な温度条件を維持するように設計された高性能絶縁材料です。 Semicorex は、優れた熱管理を備えた高度なソリューションを提供し、重要な半導体製造アプリケーションにおいて高品質の材料と信頼性の高いパフォーマンスを保証します。*

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炭素繊維硬質フェルト

炭素繊維硬質フェルト

Semicorex 炭素繊維硬質フェルトは、高温環境、特に半導体結晶成長プロセスで使用するために設計された高性能材料であり、るつぼや絶縁ライニングなどの重要なコンポーネントとして機能します。 Semicorex は、優れた熱安定性、寸法精度、耐久性を備えた高度で高品質な材料を提供し、半導体製造における最適なパフォーマンスと効率を保証します。*

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グラファイトフェルト

グラファイトフェルト

Semicorex グラファイト フェルトは、柔軟性、軽量、高効率の断熱材で、高温用途に最適です。 Semicorex は、優れた耐久性と信頼性を実現する高品質のグラファイト フェルトを提供しており、高度な断熱ソリューションを要求する業界にとって最適な選択肢となっています。

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ガラス状カーボンコーティングを施した硬質フェルト

ガラス状カーボンコーティングを施した硬質フェルト

ガラス状カーボンコーティングを施したセミコレックス硬質フェルトは、カーボンファイバーフェルトの耐久性と、傷がつきにくく防塵性のあるガラス状カーボンコーティングを組み合わせた高性能断熱材です。 Semicorex の高度なコーティング技術に関する専門知識により、卓越した耐久性と清浄性が保証され、高温および精度が重要な用途の要求に応えます。*

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Semicorex は 特殊グラファイト を長年生産しており、中国のプロの 特殊グラファイト メーカーおよびサプライヤーの 1 つです。バルク梱包を提供する高度で耐久性のある製品を購入すると、迅速な配達で大量の製品を保証します。長年にわたり、お客様にカスタマイズされたサービスを提供してきました。お客様は当社の製品と優れたサービスに満足しています。私たちはあなたの信頼できる長期的なビジネスパートナーになることを心から楽しみにしています!私たちの工場から製品を購入することを歓迎します。
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