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Special graphite is a kind of artificial graphite that is processed. It is an important material that is indispensable in all aspects of semiconductor and photovoltaic manufacturing process, including crystal growth, ion implantation, epitaxy, etc.


1. Silicon Carbide (SiC) Crystal Growth

Silicon carbide, as a third-generation semiconductor material, is widely used in new energy vehicles, 5G communications, and other fields. In the 6-inch and 8-inch SiC crystal growth process, isostatic graphite is primarily used to manufacture the following key components:

Graphite crucible: This can be used to synthesize SiC powder feedstock and also assist in crystal growth at high temperatures. Its high purity, high-temperature resistance, and thermal shock resistance ensure a stable crystal growth environment.

Graphite heater: This provides uniform heat distribution, ensuring high-quality SiC crystal growth.

Insulation tube: This maintains temperature uniformity within the crystal growth furnace and reduces heat loss.


2. Ion Implantation

Ion implantation is a key process in semiconductor manufacturing. Isostatic graphite is primarily used to manufacture the following components in ion implanters:

Graphite getter: This absorbs impurity ions in the ion beam, ensuring ion purity.

Graphite focusing ring: This focuses the ion beam, improving ion implant accuracy and efficiency. Graphite substrate trays: Used to support silicon wafers and maintain stability and consistency during ion implantation.


3. Epitaxy Process

The epitaxy process is a critical step in semiconductor device manufacturing. Isostatically pressed graphite is primarily used to manufacture the following components in epitaxy furnaces:

Graphite trays and susceptors: Used to support silicon wafers, providing stable support and uniform heat conduction during the epitaxy process.


4. Other Semiconductor Manufacturing Applications

Isostatically pressed graphite is also widely used in the following semiconductor manufacturing applications:

Etching Process: Used to manufacture graphite electrodes and protective components for etchers. Its corrosion resistance and high purity ensure stability and precision in the etching process.

Chemical Vapor Deposition (CVD): Used to manufacture graphite trays and heaters within CVD furnaces. Its high thermal conductivity and high-temperature resistance ensure uniform thin film deposition.

Packaging Testing: Used to manufacture test fixtures and carrier trays. Its high precision and low contamination ensure accurate test results.


Advantages of graphite parts


High purity:

Using high-purity isostatically pressed graphite material with extremely low impurity content, it meets the stringent material purity requirements of semiconductor manufacturing. The company's own purification furnace can purify graphite to below 5ppm.


High precision:

With advanced processing equipment and mature processing technology, it ensures that the product's dimensional accuracy and form and position tolerances reach the micron level.


High performance:

The product has excellent high temperature resistance, corrosion resistance, radiation resistance, high thermal conductivity and other properties, meeting the various harsh working conditions of semiconductor manufacturing.


Customized service:

Customized product design and processing services can be provided according to customer needs to meet the needs of different application scenarios.


Types of graphite products

(1) Isostatic graphite
Isostatic graphite products are produced by cold isostatic pressing. Compared with other forming methods, the crucibles produced by this process have excellent stability. The graphite products required for SiC single crystals are all large in size, which will lead to uneven purity on the surface and inside of the graphite products, which cannot meet the use requirements. In order to meet the deep purification requirements of large-sized graphite products required for SiC single crystals, a unique high-temperature thermochemical pulse purification process should be adopted to achieve deep and uniform purification of large-sized or special-shaped graphite products, so that the purity of the product surface and core can meet the use requirements.


(2) Porous graphite
Porous graphite is a type of graphite with high porosity and low density. In the SiC crystal growth process, porous graphite plays a significant role in improving mass transfer uniformity, reducing the occurrence rate of phase change and improving the crystal shape.
The use of porous graphite improves the temperature and temperature uniformity of the raw material area, increases the axial temperature difference in the crucible, and also has a certain effect on weakening the recrystallization of the raw material surface; in the growth chamber, porous graphite improves the stability of material flow throughout the growth process, increases the C/Si ratio of the growth area, helps to reduce the probability of phase change, and at the same time, porous graphite also plays a role in improving the crystal interface.


(3) Felt
Soft felt and hard felt both play the role of important thermal insulation materials in SiC crystal growth and epitaxial links.


(4) Graphite foil
Graphite paper is a functional material made from high-carbon flake graphite through chemical treatment and high-temperature rolling. It has high thermal conductivity, electrical conductivity, flexibility, and corrosion resistance.


(5) Composite materials
Carbon-carbon thermal field is one of the core consumables in photovoltaic single crystal furnace production.


Semicorex Production

Semicorex make graphite with small-batch, customized production methods. The small-batch production makes the products more controllable. The entire process is controlled by Programmable Logic Controllers (PLCs), the detailed process data were recorded, enabling complete lifecycle traceability.

During the entire roasting process, the consistency achieved in resistivity across different locations, and the tight temperature control maintained. This ensures the homogeneity and reliability of the graphite materials.

Semicorex utilize fully isostatic pressing technology, which is different from other suppliers; it means the graphite is ultra uniform itself and is proven particularly important in epitaxial processes. The comprehensive material uniformity tests were conducted, including density, resistivity, hardness, bending strength, and strength across different samples.




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結晶成長用るつぼ

結晶成長用るつぼ

セミコレックスの結晶成長用坩堝は、半導体デバイス製造の基本である単結晶成長の制御を実現するために不可欠です。これらのるつぼは、半導体部門の厳しい基準を満たすように細心の注意を払って設計されており、あらゆる用途にわたって最高のパフォーマンスと効率を保証します。私たちセミコレックスは、品質とコスト効率を融合した高性能結晶成長るつぼの製造と供給に専念しています。

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溶けるための等造積グラファイトのるつぼ

溶けるための等造積グラファイトのるつぼ

Semicorex 溶融用等方性グラファイトるつぼは、材料密度と機械的特性を向上させる等方性プレス技術を使用して製造されています。これにより、半導体プロセスに特有の極端な温度や腐食環境に耐えるだけでなく、長期にわたる耐久性も備えた容器が実現しました。るつぼの堅牢性により、繰り返しの熱サイクルに劣化することなく対処できるため、長期間の稼働期間にわたって一貫したパフォーマンスが得られます。私たちセミコレックスは、品質とコスト効率を融合した、溶解用の高性能等方性グラファイトるつぼの製造と供給に専念しています。

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サファイア結晶成長絶縁体

サファイア結晶成長絶縁体

Semicorex サファイア結晶成長絶縁体は、サファイア単結晶炉の運転に不可欠な役割を果たし、結晶成長プロセス全体を通じて重要な機能の先頭に立ちます。これらのコンポーネントは、安定した炉温度を維持することにより、エネルギー損失を大幅に削減し、成長する結晶の品質を向上させます。私たちセミコレックスは、品質とコスト効率を融合した高性能サファイア結晶成長絶縁体の製造と供給に専念しています。

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サファイア結晶成長ヒーター

サファイア結晶成長ヒーター

Semicorex サファイア結晶成長ヒーターを使用して、精密な熱管理の能力を強化します。このヒーターは、最適なパフォーマンスを実現するために細心の注意を払って設計されており、結晶成長操作における優れた要素としての役割を強化する SiC 層の統合を誇り、高効率と信頼性の両方を促進します。セミコレックスは、高性能サファイア結晶成長ヒーターの製造と供給に専念しています。品質とコスト効率を融合させます。

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等方黒鉛るつぼ

等方黒鉛るつぼ

Semicorex 等方性グラファイトるつぼは、半導体材料の熱処理、特に単結晶の製造に使用される特殊な容器です。これは、半導体デバイスの製造に不可欠な単結晶構造の制御された成長において重要な役割を果たします。 Semicorex は高品質の製品を競争力のある価格で提供することに尽力しており、中国における長期的なパートナーとなることを楽しみにしています。

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PECVDグラファイトボート

PECVDグラファイトボート

Semicorex は、カスタマイズされたサービスを備えた高品質の PECVD グラファイト ボートを提供します。 Semicorex は高品質の製品を競争力のある価格で提供することに尽力しており、中国における長期的なパートナーとなることを楽しみにしています。

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Semicorex は 特殊グラファイト を長年生産しており、中国のプロの 特殊グラファイト メーカーおよびサプライヤーの 1 つです。バルク梱包を提供する高度で耐久性のある製品を購入すると、迅速な配達で大量の製品を保証します。長年にわたり、お客様にカスタマイズされたサービスを提供してきました。お客様は当社の製品と優れたサービスに満足しています。私たちはあなたの信頼できる長期的なビジネスパートナーになることを心から楽しみにしています!私たちの工場から製品を購入することを歓迎します。
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